Study on the rheological properties and polishing properties of SiO2@CI composite particle for sapphire wafer
Author(s): |
Jisheng Pan
Zhijun Chen Qiusheng Yan |
---|---|
Medium: | journal article |
Language(s): | English |
Published in: | Smart Materials and Structures, September 2020, n. 11, v. 29 |
Page(s): | 114003 |
DOI: | 10.1088/1361-665x/abb21c |
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data sheet - Reference-ID
10434618 - Published on:
11/09/2020 - Last updated on:
30/09/2020