Stress in low-temperature plasma enhanced chemical vapour deposited silicon nitride thin films
| Author(s): |
M. Martyniuk
J. Antoszewski C. A. Musca J. M. Dell L. Faraone |
|---|---|
| Medium: | journal article |
| Language(s): | English |
| Published in: | Smart Materials and Structures, February 2006, n. 1, v. 15 |
| Page(s): | S29-S38 |
| DOI: | 10.1088/0964-1726/15/1/006 |
- About this
data sheet - Reference-ID
10223009 - Published on:
04/12/2018 - Last updated on:
04/12/2018
Structurae cooperates with
