Stability and microbial toxicity of HfO2 and ZrO2 nanoparticles for photolithography
| Author(s): |
Jorge Gonzalez-Estrella
Jim A. Field Christopher K. Ober Reyes Sierra-Alvarez |
|---|---|
| Medium: | journal article |
| Language(s): | English |
| Published in: | Green Materials, September 2019, n. 3, v. 7 |
| Page(s): | 109-117 |
| DOI: | 10.1680/jgrma.18.00056 |
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10520834 - Published on:
08/12/2020 - Last updated on:
19/02/2021
Structurae cooperates with
