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A numerical study on airflow and dynamic cross-contamination in the super cleanroom for photolithography process

Author(s):


Medium: journal article
Language(s): English
Published in: Building and Environment, , n. 11, v. 40
Page(s): 1431-1440
DOI: 10.1016/j.buildenv.2004.11.016
Structurae cannot make the full text of this publication available at this time. The full text can be accessed through the publisher via the DOI: 10.1016/j.buildenv.2004.11.016.
  • About this
    data sheet
  • Reference-ID
    10392577
  • Published on:
    26/11/2019
  • Last updated on:
    26/11/2019
 
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