Deep reactive ion etching: a promising technology for micro- and nanosatellites
| Author(s): |
A. A. Ayón
R. L. Bayt K. S. Breuer |
|---|---|
| Medium: | journal article |
| Language(s): | English |
| Published in: | Smart Materials and Structures, December 2001, n. 6, v. 10 |
| Page(s): | 1135-1144 |
| DOI: | 10.1088/0964-1726/10/6/302 |
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10215663 - Published on:
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04/12/2018
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