Contaminant particles removal by negative air ionic cleaner in industrial minienvironment for IC manufacturing processes
| Author(s): |
Angus Shiue
Shih-Cheng Hu |
|---|---|
| Medium: | journal article |
| Language(s): | English |
| Published in: | Building and Environment, August 2011, n. 8, v. 46 |
| Page(s): | 1537-1544 |
| DOI: | 10.1016/j.buildenv.2011.01.006 |
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10390850 - Published on:
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26/11/2019
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