The use of titanium and titanium dioxide as masks for deep silicon etching
| Author(s): |
Olly Powell
Denis Sweatman H. Barry Harrison |
|---|---|
| Medium: | journal article |
| Language(s): | English |
| Published in: | Smart Materials and Structures, February 2006, n. 1, v. 15 |
| Page(s): | S81-S86 |
| DOI: | 10.1088/0964-1726/15/1/013 |
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04/12/2018
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