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Performance improvement through CFD and field measurement in a unidirectional airflow cleanroom for wafer manufacture

Author(s): ORCID


Medium: journal article
Language(s): English
Published in: Journal of Building Engineering, , v. 100
DOI: 10.1016/j.jobe.2024.111715
Structurae cannot make the full text of this publication available at this time. The full text can be accessed through the publisher via the DOI: 10.1016/j.jobe.2024.111715.
  • About this
    data sheet
  • Reference-ID
    10806708
  • Published on:
    13/01/2025
  • Last updated on:
    13/01/2025
 
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