The effects of annealing and wake-up cycling on the ferroelectricity of zirconium hafnium oxide ultrathin films prepared by remote plasma atomic layer deposition
Author(s): |
Tzu-Yao Hsu
Chin-Lung Kuo Bo-Ting Lin Jay Shieh Miin-Jang Chen |
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Medium: | journal article |
Language(s): | English |
Published in: | Smart Materials and Structures, August 2019, n. 8, v. 28 |
Page(s): | 084005 |
DOI: | 10.1088/1361-665x/ab23c3 |
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10313660 - Published on:
30/06/2019 - Last updated on:
26/07/2019