Christopher K. Ober
- Stability and microbial toxicity of HfO2 and ZrO2 nanoparticles for photolithography. Dans: Green Materials, v. 7, n. 3 (septembre 2019). (2019):
- Lithography performance and environmental compatibility of PFOS-free photoacid generators. Dans: Green Materials, v. 5, n. 4 (décembre 2017). (2017):
- Oligopeptide-modified hydrophobic and hydrophilic polymers as antifouling coatings. Dans: Green Materials, v. 5, n. 1 (mars 2017). (2017):