L. Faraone
- Microelectronics, MEMS and Nanotechnology. Dans: Smart Materials and Structures, v. 15, n. 1 (février 2006). (2006):
- Stress in low-temperature plasma enhanced chemical vapour deposited silicon nitride thin films. Dans: Smart Materials and Structures, v. 15, n. 1 (février 2006). (2006):