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IIoT-Supported Manufacturing-Material-Flow Tracking in a DES-Based Digital-Twin Environment

Auteur(s): (Central Campus Győr, Széchenyi István University, H-9026 Győr, Hungary)
ORCID (Central Campus Győr, Széchenyi István University, H-9026 Győr, Hungary)
Médium: article de revue
Langue(s): anglais
Publié dans: Infrastructures, , n. 4, v. 8
Page(s): 75
DOI: 10.3390/infrastructures8040075
Abstrait:

Manufacturing processes can be cited as significant research areas when examining infrastructure systems and infrastructure, as they are inextricably linked to both. Examples include automobile manufacturing, the production of traffic signs, etc. Connecting and utilizing Industry 4.0 technologies and processing simulation solutions to address industry challenges, such as process optimization and fault detection, are gaining in popularity. Cyber-physical systems and digital twins connect the physical and cyber worlds to enable intelligent manufacturing capabilities, increased system flexibility, decreased manufacturing-cycle times, and improved quality. This paper presents a solution that improves the synchronization between the real (physical) and simulation (digital) layers, using discrete-event-driven simulations to create more efficient and accurate digital-twin environments. Using a combination of inexpensive commercial microcontrollers and an inertial-measurement-unit sensor to enhance a standard programmable logic controller process, a discrete-event-simulation-based digital layer is updated in real time to produce a live digital twin. The system can accurately identify and track products throughout the production cycle while simultaneously updating the digital twin in real time. Even independently, the algorithm running on the microcontroller can be used to gather the input parameters required for the simulation of production processes. The implemented environment can serve as a suitable testing ground for investigating the practical applicability of digital-twin solutions.

Copyright: © 2023 the Authors. Licensee MDPI, Basel, Switzerland.
License:

Cette oeuvre a été publiée sous la license Creative Commons Attribution 4.0 (CC-BY 4.0). Il est autorisé de partager et adapter l'oeuvre tant que l'auteur est crédité et la license est indiquée (avec le lien ci-dessus). Vous devez aussi indiquer si des changements on été fait vis-à-vis de l'original.

  • Informations
    sur cette fiche
  • Reference-ID
    10722696
  • Publié(e) le:
    22.04.2023
  • Modifié(e) le:
    10.05.2023
 
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