Application of the Nitritation and Anammox Process into Inorganic Nitrogenous Wastewater from Semiconductor Factory
Auteur(s): |
Takaaki Tokutomi
(Chief Researcher, Kurita Water Industries Ltd., 1-1 Gochoyama, Kawada, Nogi-machi, Shimotsuga-gun, Tochigi 329-0105, Japan (corresponding author).)
Hideyo Yamauchi (Chief Researcher, Kurita Water Industries Ltd., 1-1 Gochoyama, Kawada, Nogi-machi, Shimotsuga-gun, Tochigi 329-0105, Japan (corresponding author).) Sosuke Nishimura (Chief Researcher, Kurita Water Industries Ltd., 1-1 Gochoyama, Kawada, Nogi-machi, Shimotsuga-gun, Tochigi 329-0105, Japan (corresponding author).) Motoyuki Yoda (Chief Researcher, Kurita Water Industries Ltd., 1-1 Gochoyama, Kawada, Nogi-machi, Shimotsuga-gun, Tochigi 329-0105, Japan (corresponding author).) Wiebe Abma (Chief Researcher, Kurita Water Industries Ltd., 1-1 Gochoyama, Kawada, Nogi-machi, Shimotsuga-gun, Tochigi 329-0105, Japan (corresponding author).) |
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Médium: | article de revue |
Langue(s): | anglais |
Publié dans: | Journal of Environmental Engineering (ASCE), février 2011, n. 2, v. 137 |
Page(s): | 146-154 |
DOI: | 10.1061/(asce)ee.1943-7870.0000303 |
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sur cette fiche - Reference-ID
10585027 - Publié(e) le:
08.03.2021 - Modifié(e) le:
08.03.2021